行家说UV 导读：
行家说UV了解到，中国科学院设计出了一种新型的“混合ArF准分子激光”技术应运而生。这种技术通过将一个窄线宽的固态193nm激光种子集成到ArF振荡器中，不仅提高了相干性，还实现了窄线宽，从而在高吞吐量干涉光刻中表现出更好的性能。
这一创新不仅提升了图案的精确度，还加快了光刻的速度。此外，混合ArF准分子激光的高光子能量和相干性使其能够直接加工各种材料，包括碳化合物和固体，且热影响最小。这种多功能性突显了其在从光刻到激光加工等不同领域的潜力。
加入UV LED群，可添加岑夕（cenxitalk）
该过程涉及来自Yb混合激光器和掺铒光纤激光器的258和1553nm泵浦激光。这一设置最终在2毫米×2毫米×30毫米的Yb:YAG块状晶体中实现功率放大，展示了令人印象深刻的结果。生成的DUV激光及其221nm对应激光的平均功率为60毫瓦，脉冲宽度为4.6纳秒（ns），重复频率为6千赫兹（kHz），线宽约为640兆赫兹（MHz）。
值得注意的是，这是由LBO晶体产生的193和221nm激光的最高功率输出，同时也是报道的193nm激光的最窄线宽。特别值得注意的是，该研究实现了卓越的转换效率：221到193nm的转换效率为27%，258到193nm的转换效率为3%，树立了新的效率基准。
来源：综合整理、半导体激光
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